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Photo-induced fragmentation of a tin-oxo cage compound

Abstract : Tin-oxo cage materials are of interest for use as photoresists for EUV (Extreme-Ultraviolet) lithography (13.5 nm, 92 eV), owing to their large absorption cross section for EUV light. In this work we exposed an n-butyl tin-oxo cage dication in the gas phase to photons in the energy range 4-14 eV to explore its fundamental photoreactivity. At all energies above the onset of electronic absorption at similar to 5 eV (similar to 250 nm) cleavage of tin-carbon bonds was observed. With photon energies >12 eV (<103 nm) photoionization can occur, leading to 3+ ions. Besides the higher charge promotion, butyl chain loss without electron ejection (leading to 2+ fragments) still occurs.
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https://hal.inrae.fr/hal-02627095
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Submitted on : Tuesday, May 26, 2020 - 7:05:48 PM
Last modification on : Thursday, November 18, 2021 - 3:52:18 AM

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Jarich Haitjema, Lianjia Wu, Alexandre Giuliani, Laurent Nahon, Sonia Castellanos, et al.. Photo-induced fragmentation of a tin-oxo cage compound. Journal of Photopolymer Science and Technology, Technical Assoc of Photopolymers Japan, 2018, 31 (2), pp.243-247. ⟨10.2494/photopolymer.31.243⟩. ⟨hal-02627095⟩

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