Band gap Annealing B3 Solar cells Capacitance TiO2 Carbon NEXAFS Alzheimer's disease Copper Integrated optics Carbon Nanotube CaTiO3Pr^3^+ CHLORINE PLASMAS Amorphous Ablation laser Non-volatile memory Functionalization Kirkendall effect Plasma etching Scanning electron microscopy Mott insulator Alloying Anatase Sputtering PECVD TEM Avalanche breakdown B2 Quaternary Ambipolar material Atomic layer etching Applications industrielles Colloidal solution Chalcogenide V2O3 Semiconductors SF 6 Low-pressure plasma processing Transmission electron microscopy 3 nm in size CNTs’ collapse Residual stress A1 Characterization Vanadium Sesquioxide Resistive switching Sol-gel Nanotubes A Chalcogenides A-CNx Bixbyite Mott insulators Bipolar resistive switching BRS Rutile B Chemical synthesis Magnetron sputtering AuCu alloy Structure Thin films Plasmas froids Optical properties CIGSe Transfert d'énergie Physical vapor deposition Films CH4 Amyloid precursor Biomasse Titanium dioxide Adsorption XPS Mass spectrometry A3 Physical vapor deposition processes A Multilayers Thin film Optical interferometry Buffer Couple Biomembranes Aluminium nitride Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation Atomic force microscopy C Photoelectron spectroscopy Etching B2 Semiconducting alloys Biofilms microbiens X-ray diffraction Optical waveguides AZO thin films Biocapteurs A Thin films X-ray photoelectron spectroscopy BOMBARDMENT Selenization Band alignment B2 Semiconducting indium compounds Oxides Nanocomposite Aryl-diazonium salts AlN Calcined clay Spectroscopic ellipsometry B1 Inorganic compounds