Alloying Semiconductors Anatase Atomic layer etching B Chemical synthesis Band alignment Carbon nanotubes Applications industrielles Adsorption Thin film TEM Biomasse AlN Carbon Mott insulators Aluminium nitride B3 Solar cells CHLORINE PLASMAS Bipolar resistive switching BRS Chemical detection Resistive switching SF 6 AZO thin films Carbon Nanotube Oxides NEXAFS Non-volatile memory Amorphous Buffer Couple A1 Characterization Amyloid precursor Carbon nitride Chalcogenide Residual stress BOMBARDMENT Sputtering V2O3 A Multilayers CaTiO3Pr^3^+ Avalanche breakdown Scanning electron microscopy Ablation laser Bixbyite Aryl-diazonium salts Nanotubes Calcined clay Transfert d'énergie Chemical and biological sensors Biocapteurs Titanium dioxide Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation 3 nm in size Etching Chalcogenide glass A-CNx Plasma etching Physical vapor deposition C Photoelectron spectroscopy Capacitance X-ray diffraction Cathepsin Structure Spectroscopic ellipsometry Ambipolar material Biofilms microbiens Kirkendall effect Chalcogenides XPS PECVD TiO2 Atomic force microscopy X-ray photoelectron spectroscopy Magnetron sputtering Optical properties CNTs’ collapse Thin films Selenization Copper B2 Semiconducting alloys Plasmas froids Band gap Low-pressure plasma processing A Thin films Sol-gel Colloidal solution CIGSe B2 Quaternary Vanadium Sesquioxide Films CH4 Transmission electron microscopy Alzheimer's disease B1 Inorganic compounds Functionalization AuCu alloy A3 Physical vapor deposition processes Mott insulator A Chalcogenides B2 Semiconducting indium compounds Nanocomposite