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Article Dans Une Revue Microelectronics Reliability Année : 2001

Simulation and experimental comparison of GGNMOS and LVTSCR protection cells under ElectroStatic Discharges

A. Guilhaume
  • Fonction : Auteur
P. Galy
  • Fonction : Auteur
B. Foucher
  • Fonction : Auteur
F. Blanc
  • Fonction : Auteur

Résumé

To assess the capabilities of the device simulation tool in the field of ElectroStatic Discharges (ESD), two protection structures were studied: a Grounded Gate NMOS transistor (GGNMOS) and a Low Voltage Threshold Silicon Controlled Rectifier (LVTSCR). Both compounds were tested with the Transmission Line Pulse test method and simulated with the software Dessis-ISE. Hence, checking the behaviour of each device in terms of ESD has been possible. (C) 2001 Elsevier Science Ltd. All rights reserved.
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Dates et versions

hal-00140578 , version 1 (06-04-2007)

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  • HAL Id : hal-00140578 , version 1

Citer

A. Guilhaume, P. Galy, Jean-Pierre Chante, B. Foucher, F. Blanc. Simulation and experimental comparison of GGNMOS and LVTSCR protection cells under ElectroStatic Discharges. Microelectronics Reliability, 2001, 41 (9-10), pp.1433-1437. ⟨hal-00140578⟩
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