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Stress, Drug Resistance, Adhesion: the dark side of the wall

Hélène Martin-yken 1 C Formosa-Dague 1 M Schiavone 1 Jean Marie François 1 Etienne Dague 2, 2 
1 LISBP - Laboratoire d'Ingénierie des Systèmes Biologiques et des Procédés
2 LAAS-ELIA - Équipe Ingénierie pour les sciences du vivant
LAAS - Laboratoire d'analyse et d'architecture des systèmes
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Conference papers
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https://hal.inrae.fr/hal-02949505
Contributor : Hélène Martin-Yken Connect in order to contact the contributor
Submitted on : Friday, September 25, 2020 - 4:13:15 PM
Last modification on : Wednesday, June 1, 2022 - 4:40:23 AM
Long-term archiving on: : Thursday, December 3, 2020 - 6:10:19 PM

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  • HAL Id : hal-02949505, version 1

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UNIV-TLSE2 | UNIV-TLSE3 | CNRS | INSA-TOULOUSE | INRA | LAAS | UT1-CAPITOLE | LAAS-MICRO-NANO-BIO-TECHNOLOGIES | LAAS-ELIA | INSA-GROUPE | TBI | INRAE | UNIV-UT3

Citation

Hélène Martin-yken, C Formosa-Dague, M Schiavone, Jean Marie François, Etienne Dague. Stress, Drug Resistance, Adhesion: the dark side of the wall. Nano In Bio : Advances for Life and Material sciences, May 2016, Le Gosier, France. ⟨hal-02949505⟩

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